federal_register: E6-17224
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| document_number | title | type | abstract | publication_date | pub_year | pub_month | html_url | pdf_url | agency_names | agency_ids | excerpts |
|---|---|---|---|---|---|---|---|---|---|---|---|
| E6-17224 | National Emission Standards for Hazardous Air Pollutants for Semiconductor Manufacturing | Proposed Rule | EPA is proposing amendments to the national emission standards for hazardous air pollutants (NESHAP) for Semiconductor Manufacturing, published on May 22, 2003. We are proposing amendments to the final rule to clarify the emission requirements for process vents by establishing a new maximum achievable control technology (MACT) floor level of control for combined hazardous air pollutants (HAP) process vent streams containing inorganic and organic HAP and adding new source requirements for combined HAP process vents. Requirements for existing combined HAP process vents would be no control, which is the MACT floor. The new source combined HAP process vent limit would be the same level of control as is currently required for new inorganic and organic HAP process vents. | 2006-10-19 | 2006 | 10 | https://www.federalregister.gov/documents/2006/10/19/E6-17224/national-emission-standards-for-hazardous-air-pollutants-for-semiconductor-manufacturing | https://www.govinfo.gov/content/pkg/FR-2006-10-19/pdf/E6-17224.pdf | Environmental Protection Agency | 145 | EPA is proposing amendments to the national emission standards for hazardous air pollutants (NESHAP) for Semiconductor Manufacturing, published on May 22, 2003. We are proposing amendments to the final rule to clarify the emission requirements for... |