federal_register: 02-11298
Data license: Public Domain (U.S. Government data) · Data source: Federal Register API & Regulations.gov API
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| document_number | title | type | abstract | publication_date | pub_year | pub_month | html_url | pdf_url | agency_names | agency_ids | excerpts | regulation_id_numbers |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| 02-11298 | National Emission Standards for Hazardous Air Pollutants: Semiconductor Manufacturing | Proposed Rule | This action proposes national emission standards for hazardous air pollutants (NESHAP) for semiconductor manufacturing operations. The EPA has identified these operations as major sources of emissions of hazardous air pollutants (HAP) such as hydrochloric acid (HCl), hydrofluoric acid (HF), glycol ethers, methanol, and xylene. These HAP are associated with a variety of adverse health effects. These adverse health effects include irritation of the lung, skin, and mucus membranes, effects on the central nervous system, and damage to the skeleton system. These proposed NESHAP would require all semiconductor manufacturing facilities that are major sources to meet emission standards reflecting the application of the maximum achievable control technology (MACT). | 2002-05-08 | 2002 | 5 | https://www.federalregister.gov/documents/2002/05/08/02-11298/national-emission-standards-for-hazardous-air-pollutants-semiconductor-manufacturing | https://www.govinfo.gov/content/pkg/FR-2002-05-08/pdf/02-11298.pdf | Environmental Protection Agency | 145 | This action proposes national emission standards for hazardous air pollutants (NESHAP) for semiconductor manufacturing operations. The EPA has identified these operations as major sources of emissions of hazardous air pollutants (HAP) such as... |