documents: EPA-HQ-OAR-2009-0927-0143

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id agency_id docket_id title document_type subtype posted_date posted_year posted_month comment_start_date comment_end_date last_modified fr_doc_num open_for_comment withdrawn object_id
EPA-HQ-OAR-2009-0927-0143 EPA EPA-HQ-OAR-2009-0927 CFx (x = 1-3) Radical Densities During Si, SiO2 and Si3N4 Etching Employing Electron Cyclotron Resonance CHF3 Plasma. Miyata et al. (1997) Supporting & Related Material Publication - Copyrighted Materials 2010-12-01T05:00:00Z 2010 12     2012-01-03T14:30:57Z   0 0 0900006480b76d18

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