id,agency_id,docket_id,title,document_type,subtype,posted_date,posted_year,posted_month,comment_start_date,comment_end_date,last_modified,fr_doc_num,open_for_comment,withdrawn,object_id
EPA-HQ-RCRA-2000-0026-0001,EPA,EPA-HQ-RCRA-2000-0026,Approval and Promulgation of Air Quality Implementation Plans; Maryland; Withdrawal of Proposed Rule [F-2000-IBMP-FFFFF],Proposed Rule,Federal Register Document,2000-06-16T04:00:00Z,2000,6,2000-06-16T04:00:00Z,2000-07-18T03:59:59Z,2008-01-08T21:06:33Z,37739,0,0,09000064800df09e
EPA-HQ-RCRA-2000-0026-0006,EPA,EPA-HQ-RCRA-2000-0026,"Project XL Site-Specific Rulemaking for the IBM Semiconductor Manufacturing Facility in Essex Junction, VT [F-2000-IBMP-S0005]",Notice,Federal Register Document,2000-06-14T04:00:00Z,2000,6,2000-06-14T04:00:00Z,2000-07-18T03:59:59Z,2008-01-08T21:09:42Z,37780,0,0,09000064800df0bb
EPA-HQ-RCRA-2000-0026-0004,EPA,EPA-HQ-RCRA-2000-0026,"Project XL Proposal: Management of Semiconductor Rinsewaters from 
a Copper Plating Process [F-2000-IBMP-S0003]",Supporting & Related Material,Other,2000-06-14T04:00:00Z,2000,6,,,2006-10-23T20:00:12Z,,0,0,09000064800df0b1
EPA-HQ-RCRA-2000-0026-0002,EPA,EPA-HQ-RCRA-2000-0026,IBM Final Project Agreement: IBM Copper Metallization  XL Project [F-2000-IBMP-S0001],Supporting & Related Material,Other,2000-06-14T04:00:00Z,2000,6,,,2006-10-23T20:00:12Z,,0,0,09000064800df0a4
EPA-HQ-RCRA-2000-0026-0005,EPA,EPA-HQ-RCRA-2000-0026,"Analytical Data: IBM Burlington Semiconductor Manufacturing Facility, Copper Metallization Plating Bath [F-2000-IBMP-S0004]",Supporting & Related Material,Other,2000-06-14T04:00:00Z,2000,6,,,2006-10-23T20:00:12Z,,0,0,09000064800df0b8
EPA-HQ-RCRA-2000-0026-0003,EPA,EPA-HQ-RCRA-2000-0026,"F006 Background Document: Electroplating and Metal Finishing 
Operations, (Pages 105-143 Only) [F-2000-IBMP-S0002]",Supporting & Related Material,Other,2000-06-14T04:00:00Z,2000,6,,,2006-10-23T20:00:12Z,,0,0,09000064800df0ac
EPA-HQ-RCRA-2000-0026-0007,EPA,EPA-HQ-RCRA-2000-0026,"Project XL Site-Specific Rulemaking for the IBM Semiconductor Manufacturing Facility in Essex Junction, VT [F-2000-IBMP-S0006]",Rule,Federal Register Document,2000-06-14T04:00:00Z,2000,6,,,2008-01-08T21:20:30Z,54955,0,0,09000064800df0be