id,agency_id,docket_id,title,document_type,subtype,posted_date,posted_year,posted_month,comment_start_date,comment_end_date,last_modified,fr_doc_num,open_for_comment,withdrawn,object_id
EPA-HQ-OAR-2002-0086-0002,EPA,EPA-HQ-OAR-2002-0086,"Supporting Statement - ICR No. 2042.02, OMB No. 2060-New Collection",Supporting & Related Material,Other,2003-02-28T05:00:00Z,2003,2,,,2006-09-02T14:12:29Z,,0,0,09000064800bac95
EPA-HQ-OAR-2002-0086-0003,EPA,EPA-HQ-OAR-2002-0086,"Supporting Tables - ICR No. 2042.02, OMB No. 2060-New Collection",Supporting & Related Material,Other,2003-02-28T05:00:00Z,2003,2,,,2006-09-02T14:12:29Z,,0,0,09000064800bac9c
EPA-HQ-OAR-2002-0086-0008,EPA,EPA-HQ-OAR-2002-0086,"Memorandum to John Schaefer, USEPA from David Hendricks, EC/R Incorporated re: Revised MACT Floor Recommendations for Process Vents for the Semiconductor Manufacturing Source Category in Response to Comments Received on the Proposed Rule [A-97-15 II-A-9]",Supporting & Related Material,Other,2003-02-28T05:00:00Z,2003,2,,,2006-09-02T14:12:30Z,,0,0,09000064800bacbc
EPA-HQ-OAR-2002-0086-0001,EPA,EPA-HQ-OAR-2002-0086,"OMB 83-I Form - ICR No. 2042.02, OMB No. 2060-New Collection",Supporting & Related Material,Office of Management and Budget (OMB),2003-02-28T05:00:00Z,2003,2,,,2006-09-02T14:12:29Z,,0,0,09000064800bac90